This inventor holds 2 USPTO granted patents. Top assignee: Dowa Mining Co., Ltd.. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: Tsuyoshi Nishimura: Innovator in ITO Technology
Introduction
Tsuyoshi Nishimura is a prominent inventor based in Honjo, Japan. He has made significant contributions to the field of indium tin oxide (ITO) technology, particularly in the development of advanced materials for sputtering applications. With a total of 2 patents, his work has had a notable impact on the industry.
Latest Patents
Nishimura's latest patents include innovations such as Sintered ITO and an ITO sputtering target. The Sintered ITO features a relative density of at least 88% and an oxygen content ranging from 15.5 to 17.0 wt %. The ITO sputtering target, made from this sintered ITO, allows for an expanded optimal range of oxygen proportions in the argon and oxygen gas mixture used during sputtering. This advancement facilitates the consistent formation of high-quality ITO films. Additionally, his patents detail the starting powders for ITO production, specifying the salts, precipitants, and reaction conditions necessary to synthesize a starting oxide that is free from volatile components. The process includes dispersing the starting oxide into particles with specified flowability, pressing them into a compact, and sintering them in either air or an oxygen-rich atmosphere to create a high-density sinter suitable for sputtering targets.
Career Highlights
Tsuyoshi Nishimura is associated with Dowa Mining Co., Ltd., where he has been instrumental in advancing ITO technology. His expertise and innovative approach have positioned him as a key figure in the development of materials that enhance the performance of electronic devices.
Collaborations
Nishimura has collaborated with notable colleagues such as Kohichiro Eshima and Kouki Toishi. Their combined efforts have contributed to the advancement of ITO technology and its applications in various industries.
Conclusion
In summary, Tsuyoshi Nishimura is a distinguished inventor whose work in ITO technology has led to significant advancements in the field. His patents and contributions continue to influence the development of high-performance materials for electronic applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile