Dowa Mining Co., Ltd.

Kohichiro Eshima

Choju Nagata

Kouki Toishi

Tsuyoshi Nishimura

Shinji Sato

Katsuaki Okabe

Yoshichika Horikawa

Tatsumi Inamura

Yoshio Moteki

A Sn-containing In oxide in the form of needles or plates comprising particles having a major axis of 0.1 &#x3bc;m or less and a minor axis of 0.05 &#x3bc;m or less.

Tin-containing indium oxides, a process for producing them, a coating solution using them and electrically conductive coatings formed of them

Sintered ITO having a relative density of at least 88% and an oxygen content of 15.5-17.0 wt %, as well as an ITO sputtering target made of this sintered ITO. Using the target, an optimal range for the proportion of oxygen in a mixture of argon and oxygen gases used as a sputtering atmosphere is sufficiently expanded to permit the consistent formation of ITO films.

Sintered ITO and an ITO sputtering target

The starting salts for ITO production, precipitant and the conditions for reaction, calcination, etc. are specified such as to synthesize a starting oxide adapted to be free from volatile components such as halides and lower oxides; the starting oxide is dispersed to particles having a specified flowability; the powder is pressed into a compact, which is sintered in either air atmosphere or an oxygen-rich atmosphere to produce a large and high-density sinter for use as an ITO sputtering target.

Starting powders for ITO production, ITO sinters and processes for

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Honjo, Japan

Kohichiro Eshima