Location History:
- Chiyoda-ku, JP (2019 - 2023)
- Tokyo, JP (2015 - 2024)
Company Filing History:
Years Active: 2015-2024
Title: Kohei Horiuchi: Innovator in Glass Substrate Technology
Introduction
Kohei Horiuchi is a prominent inventor based in Chiyoda-ku, Japan. He has made significant contributions to the field of glass substrate technology, holding a total of 7 patents. His work primarily focuses on advancements that enhance the functionality and production methods of glass substrates used in semiconductor packages.
Latest Patents
Horiuchi's latest patents include innovative designs for glass substrates. One notable patent is for a glass substrate that features a through hole and a hollowed-out portion. This design includes a first principal surface and a second principal surface, with at least one hollowed-out portion and a through hole formed around it. The unique aspect of this patent is that the minimum diameter of the hollowed-out portion is smaller than the opening diameter at both principal surfaces. Another significant patent involves a glass substrate that has a mark consisting of multiple dots. Each dot has a depth ranging from 0.5 µm to 7.0 µm, with an inclination angle of the side surface between 5° and 56°.
Career Highlights
Throughout his career, Kohei Horiuchi has worked with notable companies such as AGC Inc. and Asahi Glass Company, Limited. His experience in these organizations has allowed him to refine his expertise in glass technology and contribute to various innovative projects.
Collaborations
Horiuchi has collaborated with esteemed colleagues, including Mamoru Isobe and Shigetoshi Mori. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the glass substrate sector.
Conclusion
Kohei Horiuchi's contributions to glass substrate technology are noteworthy, with a focus on enhancing the production and functionality of these essential components in semiconductor applications. His innovative patents and collaborations reflect his commitment to advancing the field.