Bachmehring, Germany

Klaus Roettger

USPTO Granted Patents = 6 

Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2012-2021

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6 patents (USPTO):Explore Patents

Title: Innovations of Klaus Roettger in Semiconductor Technology

Introduction

Klaus Roettger is a notable inventor based in Bachmehring, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of six patents. His work focuses on the development of advanced semiconductor wafers and methods for their production.

Latest Patents

Among his latest patents is a groundbreaking invention related to monocrystalline semiconductor wafers. This patent describes a method for producing semiconductor wafers that achieve an average roughness of at most 0.8 nm at a limiting wavelength of 250 µm. Additionally, the patent outlines a method for polishing semiconductor wafers, which includes a unique process that simultaneously polishes both the front and rear sides of the wafer at controlled temperatures. This innovative approach enhances the quality and performance of semiconductor materials.

Career Highlights

Klaus Roettger is currently employed at Siltronic AG, a leading company in the semiconductor industry. His expertise and innovative mindset have positioned him as a key figure in the development of high-quality semiconductor products. His contributions have not only advanced the technology but have also set new standards in the industry.

Collaborations

Klaus has collaborated with several talented individuals in his field, including Alexander Heilmaier and Leszek Mistur. These collaborations have fostered an environment of innovation and have led to the successful development of new technologies.

Conclusion

Klaus Roettger's work in semiconductor technology exemplifies the spirit of innovation and dedication to advancing the field. His patents and contributions continue to influence the industry and pave the way for future advancements.

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