This inventor holds 5 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1980-1984.
Location History:
- Boeblingen, DE (1980 - 1982)
- Weiterstadt, DE (1984)
Company Filing History:
Years Active: 1980-1984
Title: Klaus P Thiel: Innovator in Semiconductor Technology
Introduction
Klaus P Thiel is a notable inventor based in Böblingen, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work primarily focuses on innovative processes that enhance the manufacturing of semiconductor circuits.
Latest Patents
One of his latest patents is a reverse process for making chromium masks using silicon dioxide dry etch. This method involves applying a positive resist layer on a substrate covered with a chromium layer, followed by exposure through a mask pattern. The process allows for the transfer of structures with micrometer and submicrometer dimensions into chromium layers, which are essential in semiconductor production. Another significant patent describes a method for removing borosilicate and boron-rich oxides from silicon. This method improves the doping of silicon bodies by effectively removing unwanted layers through a series of chemical treatments.
Career Highlights
Klaus P Thiel is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in semiconductor technologies. His work has been instrumental in advancing the efficiency and precision of semiconductor manufacturing processes.
Collaborations
Throughout his career, Klaus has collaborated with talented individuals such as Marian Briska and Oussama Alameddine. These collaborations have contributed to the successful development of his patented technologies.
Conclusion
Klaus P Thiel's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence the manufacturing processes that are vital for modern electronics.