The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 1984
Filed:
Aug. 17, 1983
Gunther Bock, Boeblingen, DE;
Bernhard Hafner, Unterjettingen, DE;
Reinhold Muhl, Altdorf, DE;
Klaus P Thiel, Weiterstadt, DE;
International Business Machines Corporation, Armonk, NY (US);
Abstract
On a substrate (1) covered with a chromium layer (2), a positive resist layer (3) is applied, exposed through an exposure mask with the mask pattern corresponding to the negative of the respective chromium pattern, developed, and blanket-coated with a less than or equal to 10 nm thick layer (4) of silicon dioxide. Then photoresist layer (3) and the silicon layer (4) thereon are lifted off, and finally the chromium layer (2) is dry-etched, the remaining silicon dioxide layer (4) being used as an etch mask. Chromium masks are used e.g. in the production of semiconductor circuits. By means of the reverse process, structures whose smallest dimensions are in the micrometer and the submicrometer range can be transferred into chromium layers with sharp edges.