Altdorf, Germany

Reinhold Muhl


Average Co-Inventor Count = 3.9

ph-index = 5

Forward Citations = 66(Granted Patents)


Company Filing History:


Years Active: 1984-1991

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5 patents (USPTO):Explore Patents

Title: Reinhold Muhl - Innovator in Semiconductor Technology

Introduction

Reinhold Muhl, an accomplished inventor based in Altdorf, Germany, is recognized for his significant contributions to the field of semiconductor technology. With a total of five patents to his name, his work focuses on advanced fabrication processes that enhance the production of integrated semiconductor structures.

Latest Patents

Muhl's latest innovations include a novel process for making masks with structures in the submicron range. This complex process involves producing structures from photoresist or polymer materials on silicon substrates, where subsequent layers such as silicon nitride are deposited. The method emphasizes precision, allowing for the generation of registration marks essential for achieving maximum accuracy during further photolithographic steps. Another notable patent details a method for creating an integrated semiconductor structure using a three-layer resist system, enabling the etching of polysilicon layers with highly defined patterns.

Career Highlights

Throughout his career at International Business Machines Corporation (IBM), Muhl has made strides in developing techniques that push the boundaries of semiconductor manufacturing. His innovative approaches have helped streamline processes, thereby improving efficiency and accuracy in the production of integrated circuits that are critical for advancing technology.

Collaborations

Muhl has collaborated with esteemed colleagues, including Hans-Joachim Trumpp and Otto Koblinger, to further explore and refine methods in semiconductor fabrication. Their collective expertise has fostered advancements in the industry, underlining the importance of teamwork in driving innovation.

Conclusion

Reinhold Muhl's dedication to innovation in semiconductor technology is reflected in his extensive patent portfolio and collaborative efforts. His groundbreaking work continues to influence the field, paving the way for future advancements in high-precision semiconductor manufacturing.

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