The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 1982

Filed:

Dec. 03, 1980
Applicant:
Inventors:

Marian Briska, Boeblingen, DE;

Gert Metzger, Schoenaich, DE;

Klaus P Thiel, Boeblingen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
148188 ; 156653 ; 156663 ; 156628 ; 427344 ;
Abstract

A method for doping silicon bodies by the diffusion of boron into the bodies is described. The method is an improvement of processes where the silicon bodies are exposed in a first heating process to a gas mixture containing a predetermined boron quantity and boron and oxygen in a predetermined quantitative ratio and a second heating process is used to drive the boron into the silicon. In the method, a borosilicate glass layer and a boron-rich silicon dioxide layer are removed by first immersing the silicon body in hydrofluoric acid diluted with water and subsequently in an aqueous sulfuric acid/potassium permanganate solution.


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