Klaus Messmann

Title: Innovations of Klaus Messmann in Semiconductor Technology

Introduction

Klaus Messmann is a notable inventor based in Burghausen, Germany. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his expertise and innovative spirit. His work primarily focuses on the development of silicon wafers and processes that enhance their performance and reliability.

Latest Patents

Klaus Messmann's latest patents include a silicon wafer and a process for the heat treatment of a silicon wafer. This invention describes a silicon wafer that has no epitaxially deposited layer, featuring specific nitrogen and oxygen concentrations, as well as a defined thickness and density of defects. The process involves heat treating the silicon wafer on a substrate holder, with careful selection of heating rates to prevent slippages. Another significant patent is for an epitaxially coated semiconductor wafer and the process for producing it. This patent outlines a semiconductor wafer with a high degree of flatness and low surface roughness, achieved through a series of precise polishing and treatment steps.

Career Highlights

Throughout his career, Klaus Messmann has worked with prominent companies in the semiconductor industry, including Siltronic AG and Wacker Siltronic Gesellschaft für Halbleiter Materialien AG. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor manufacturing.

Collaborations

Klaus has collaborated with notable colleagues such as Wolfgang Siebert and Guido Wenski. Their combined expertise has likely fostered innovative solutions in the semiconductor field.

Conclusion

Klaus Messmann's contributions to semiconductor technology through his patents and career experiences highlight his role as a key innovator in the industry. His work continues to influence the development of advanced semiconductor materials and processes.