Kyoto, Japan

Kiyoshi Ogata

This inventor holds 25 USPTO granted patents and 1 EPO patent, primarily in Thin Film Technology. Top assignees: Nissin Electric Co., Ltd., Kuraray Co., Ltd., Sumitomo Electric Industries, Limited. Active years: 1989-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kiyoshi Ogata. Retrieved from https://idiyas.com/inventor/kiyoshi-ogata-5mgg6zwb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 84.0


Average Co-Inventor Count = 3.6

ph-index = 9

Forward Citations = 342(Granted Patents)


Location History:

  • Yawata, JP (2000 - 2002)
  • Kyoto, JP (1989 - 2011)

Company Filing History:


Years Active: 1989-2011

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Areas of Expertise:
Silicon Dot Formation
Vacuum Arc Deposition
Amorphous Carbon Coating
Thin Film Formation
Crystalline Silicon
Plasma Sputtering
Optical Recording Medium
Diamond Film
Aluminum Nitride Films
Semiconductor Packaging
Copper Film
Composite Substrate
25 patents (USPTO):Explore Patents

Title: Innovations of Kiyoshi Ogata in Silicon Dot Technology

Introduction

Kiyoshi Ogata, an esteemed inventor from Kyoto, Japan, holds an impressive portfolio of 25 patents that showcase his significant contributions to materials science and engineering. His innovative work primarily focuses on methods and apparatuses related to silicon dot formation, which have implications in various high-tech applications.

Latest Patents

Among his recent inventions, Ogata has developed a novel silicon dot forming method and apparatus. This invention enables the production of silicon dots with uniform particle diameters and consistent density distributions directly on substrates at low temperatures. The method involves supplying a hydrogen gas or a silane-containing gas into a vacuum chamber equipped with a silicon sputter target. By applying high-frequency power to generate plasma, Ogata ensures the silicon dots formed have particle diameters of 20 nm or lower, while maintaining a low temperature of 500 degrees Celsius or below.

Another notable patent focuses on a vacuum arc vapor deposition process and apparatus. This invention addresses the challenge of maintaining film-forming characteristics by counteracting the effects of magnetic fields within a magnetic filter. By strategically positioning magnets and utilizing inclined electromagnetic coils, Ogata's system enhances uniformity in the vacuum arc vapor deposition process.

Career Highlights

Kiyoshi Ogata has made significant strides in his career, contributing to renowned companies such as Nissin Electric Co., Ltd. and Sumitomo Electric Industries, Limited. His experience in these organizations has allowed him to refine his expertise in innovative technologies and materials.

Collaborations

Throughout his career, Ogata has collaborated with distinguished colleagues, including Yasunori Ando and Akinori Ebe. These partnerships have fostered a collaborative environment, leading to numerous advancements in the field of silicon-based technologies.

Conclusion

Kiyoshi Ogata stands out as a prominent inventor whose work in silicon dot technology has opened new avenues for research and industrial applications. With a total of 25 patents to his name, his innovative mindset continues to influence future developments in the field, ensuring that his contributions will endure in the realm of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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