The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2001
Filed:
Feb. 03, 1995
Akinori Ebe, Kyoto, JP;
Satoshi Nishiyama, Kyoto, JP;
Kiyoshi Ogata, Kyoto, JP;
Yasuo Suzuki, Kyoto, JP;
Nissin Electric Co., LTD, Kyoto, JP;
Abstract
A method and apparatus for radiation of ions from an ion source,onto a surface of an objective substrate T and vacuum evaporation of a predetermined material from an evaporation source,onto the surface of the substrate, simultaneously while the substrate is continuously moved. The ion radiation from the ion source,is applied to a portion of a region reached by the evaporation material from the evaporation source,upstream relative to the direction of movement of the substrate from the center of that region and which is lower in evaporation speed than the center of the region, to thereby continuously form a mixture layer of substrate material atoms and evaporation material atoms on the surface of the substrate and then continuously form a vacuum evaporation film with a predetermined thickness on the mixture layer.