Kyoto, Japan

Satoshi Nishiyama


Average Co-Inventor Count = 4.1

ph-index = 3

Forward Citations = 25(Granted Patents)


Company Filing History:


Years Active: 1994-2001

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4 patents (USPTO):Explore Patents

Title: Innovations by Satoshi Nishiyama in the Field of Ion Beam Technology

Introduction: Satoshi Nishiyama is a prominent inventor based in Kyoto, Japan, recognized for his significant contributions to the field of ion beam technology. With a total of four patents to his name, Nishiyama's work focuses on advanced methods for film formation and the development of coated substrates.

Latest Patents: Nishiyama's most recent patents showcase his expertise in innovative film forming methods and apparatuses. The first patent details a sophisticated technique where ions are radiated from an ion source onto a substrate surface while simultaneously evaporating a specific material from an evaporation source. This process allows for the continuous formation of a mixture layer of substrate material and evaporation material atoms, resulting in a vacuum evaporation film of predetermined thickness.

His second patent revolves around creating a copper film coated substrate. In this invention, the copper film demonstrates an X-ray diffraction intensity of 2.0 cps/nm or more per unit film thickness, specifically oriented in the (111) face of the copper film. The method involves controlling ion irradiation energy to achieve optimal crystal growth orientation in the copper thin film, significantly enhancing the material's properties.

Career Highlights: Satoshi Nishiyama has made a notable impact through his work at Nissin Electric Co., Ltd., an organization known for its commitment to technology and innovation. His inventions have advanced the capabilities of ion beam technology, pushing the boundaries of what is possible in substrate coating and film formation.

Collaborations: Throughout his career, Nishiyama has collaborated with esteemed colleagues, including Akinori Ebe and Kiyoshi Ogata. Their joint efforts have contributed to the successful development of cutting-edge technologies and patented inventions that enhance the industry.

Conclusion: Satoshi Nishiyama's contributions to the field of ion beam technology through his inventive patents are significant. His work not only aids in the advancement of film formation techniques but also lays the groundwork for future innovations in substrate coating processes. With a keen focus on improving material properties through controlled methods, Nishiyama continues to be a key figure in the realm of technological advancements.

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