Kyoto, Japan

Akinori Ebe

USPTO Granted Patents = 16 

 

Average Co-Inventor Count = 3.1

ph-index = 4

Forward Citations = 50(Granted Patents)


Location History:

  • Ukyo-ku, Kyoto-shi, Kyoto JP (2010)
  • Kyoto, JP (1994 - 2023)

Company Filing History:


Years Active: 1994-2025

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16 patents (USPTO):Explore Patents

Title: Akinori Ebe: Innovator in Plasma Technology

Introduction

Akinori Ebe is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of plasma technology, holding a total of 16 patents. His innovative work focuses on enhancing the efficiency of radio-frequency antennas and plasma processing devices.

Latest Patents

Among his latest patents is a groundbreaking radio-frequency antenna designed to efficiently pass a high amount of current at a radio-frequency level for plasma generation. This antenna features a metal fiber sheet, which provides a larger surface area and lower impedance compared to traditional metal plate antennas. Additionally, he has developed a plasma processing device that utilizes this advanced antenna. The device includes a vacuum container with a gas-tight opening, ensuring optimal performance in plasma generation. Another notable invention is a plasma generator that incorporates an AC power supply, power supply electrode, and ground electrode, designed to enhance the efficiency of plasma generation.

Career Highlights

Akinori Ebe has worked with notable companies such as Nissin Electric Co., Ltd. and Emd Corporation. His experience in these organizations has allowed him to refine his expertise in plasma technology and contribute to various innovative projects.

Collaborations

Akinori has collaborated with talented individuals in his field, including Yuichi Setsuhara and Kiyoshi Ogata. These partnerships have fostered a creative environment that has led to the development of cutting-edge technologies.

Conclusion

Akinori Ebe's contributions to plasma technology and his innovative patents highlight his role as a leading inventor in the field. His work continues to influence advancements in plasma generation and processing devices.

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