The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2015
Filed:
Nov. 12, 2008
Yuichi Setsuhara, Suita, JP;
Akinori Ebe, Kyoto, JP;
Eiji Ino, Uji, JP;
Shinichiro Ishihara, Takatsuki, JP;
Hajime Ashida, Kyoto, JP;
Akira Watanabe, Yokohama, JP;
Yuichi Setsuhara, Suita, JP;
Akinori Ebe, Kyoto, JP;
Eiji Ino, Uji, JP;
Shinichiro Ishihara, Takatsuki, JP;
Hajime Ashida, Kyoto, JP;
Akira Watanabe, Yokohama, JP;
EMD Corporation, Shiga, JP;
Abstract
The present invention aims at providing a plasma processing apparatus for performing a plasma processing on a planar substrate body to be processed, the apparatus being capable of generating the plasma with good uniformity and efficiently using the plasma, and having a high productivity. That is, the plasma processing apparatus according to the present invention includes: a vacuum chamber; one or plural antenna supporters (plasma generator supporters) projecting into the internal space of the vacuum chamber; radio-frequency antennas (plasma generators) attached to each antenna supporter; and a pair of substrate body holders provided across the antenna supporter in the vacuum chamber, for holding a planar substrate body to be processed.