Location History:
- Hirakata, JP (1986)
- Takatsuki, JP (1989 - 2015)
Company Filing History:
Years Active: 1986-2015
Title: Shinichiro Ishihara: Innovator in Plasma Processing Technology
Introduction
Shinichiro Ishihara is a notable inventor based in Takatsuki, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 4 patents. His work focuses on enhancing the efficiency and uniformity of plasma processing apparatuses.
Latest Patents
One of his latest inventions is a plasma processing apparatus designed to perform plasma processing on planar substrate bodies. This apparatus is capable of generating plasma with good uniformity and efficiently utilizing it, thereby achieving high productivity. The design includes a vacuum chamber, multiple antenna supporters projecting into the chamber, radio-frequency antennas attached to each supporter, and substrate body holders for processing the planar substrate.
Another significant patent is for a thin film device and a method for fabricating it. This device consists of a substrate, a conductive oxide film, and a metal film that is in contact with the conductive oxide film. The metal film includes aluminum and a metallic material with a higher standard electrode potential than aluminum, ensuring that the overall standard electrode potential of the metal film exceeds the reduction potential of the conductive oxide film.
Career Highlights
Shinichiro Ishihara has worked with prominent companies such as Matsushita Electric Industrial Co., Ltd. and Emd Corporation. His experience in these organizations has contributed to his expertise in plasma processing technologies.
Collaborations
Throughout his career, Ishihara has collaborated with esteemed colleagues, including Masatoshi Kitagawa and Takashi Hirao. These collaborations have further enriched his work and innovations in the field.
Conclusion
Shinichiro Ishihara is a distinguished inventor whose contributions to plasma processing technology have made a significant impact. His innovative patents and collaborations highlight his dedication to advancing this field.