Yuichi Setsuhara

Title: Yuichi Setsuhara: Innovator in Plasma Technology

Introduction

Yuichi Setsuhara is a prominent inventor based in Suita, Japan. He has made significant contributions to the field of plasma technology, holding a total of 9 patents. His work focuses on enhancing the efficiency and effectiveness of plasma processing apparatuses.

Latest Patents

Among his latest innovations are a radio-frequency antenna unit and a plasma processing apparatus. The radio-frequency antenna unit is designed to generate a high-density discharge plasma within a vacuum chamber. This invention features a radio-frequency antenna that allows electric current to flow, a protective tube made of an insulator surrounding the antenna, and a buffer area that suppresses electron acceleration. This configuration minimizes electric discharge occurrences, facilitating the generation of high-density discharge plasma.

The plasma processing apparatus aims to perform plasma processing on planar substrate bodies with improved uniformity and productivity. It includes a vacuum chamber, one or more antenna supporters, radio-frequency antennas, and substrate body holders. This design ensures efficient plasma generation and utilization, enhancing overall productivity in plasma processing.

Career Highlights

Yuichi Setsuhara has worked with notable organizations such as EMD Corporation and the Japan Science and Technology Agency. His experience in these institutions has contributed to his expertise in plasma technology and innovation.

Collaborations

Throughout his career, Setsuhara has collaborated with esteemed colleagues, including Akinori Ebe and Tatsuo Shoji. These partnerships have fostered advancements in his research and development efforts.

Conclusion

Yuichi Setsuhara's contributions to plasma technology through his innovative patents and collaborations highlight his role as a leading inventor in this field. His work continues to influence advancements in plasma processing and related technologies.