The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2011
Filed:
Oct. 26, 2006
Kenji Kato, Kyoto, JP;
Hiroshige Deguchi, Kyoto, JP;
Hitoshi Yoneda, Kyoto, JP;
Kiyoshi Kubota, Kyoto, JP;
Akinori Ebe, Kyoto, JP;
Yuichi Setsuhara, Osaka, JP;
Kenji Kato, Kyoto, JP;
Hiroshige Deguchi, Kyoto, JP;
Hitoshi Yoneda, Kyoto, JP;
Kiyoshi Kubota, Kyoto, JP;
Akinori Ebe, Kyoto, JP;
Yuichi Setsuhara, Osaka, JP;
Nissin Electric Co., Ltd., Kyoto, JP;
EMD Corporation, Kyoto, JP;
Abstract
Plasma producing method and apparatus wherein a plurality of high-frequency antennas are arranged in a plasma producing chamber, and a high-frequency power supplied from a high-frequency power supply device (including a power source, a phase controller and the like) is applied to a gas in the chamber from the antennas to produce inductively coupled plasma. At least some of the plurality of high-frequency antennas are arranged in a fashion of such parallel arrangement that the antennas successively neighbor to each other and each of the antennas is opposed to the neighboring antenna. The high-frequency power supply device controls a phase of a high-frequency voltage applied to each antenna, and thereby controls an electron temperature of the inductively coupled plasma.