Kiyohito Tanno is a prominent inventor based in Ibaraki-ken, Japan. He has made significant contributions to the field of semiconductor device production, particularly in polishing technologies. With a total of 12 patents to his name, Tanno's work has had a substantial impact on the industry.

Latest Patents

One of Tanno's latest patents focuses on an abrasive and a method for polishing target members, as well as a process for producing semiconductor devices. This invention aims to polish the surfaces of SiO insulating films at a high rate without causing scratches. The abrasive comprises a slurry that includes a medium and at least one of the following: cerium oxide particles with multiple crystallites and specific bulk density, or abrasive grains with pores. This innovative approach enhances the efficiency and effectiveness of semiconductor manufacturing processes.

Career Highlights

Kiyohito Tanno is currently employed at Hitachi Chemical Company, Ltd., where he continues to develop cutting-edge technologies in the semiconductor field. His expertise in polishing methods has positioned him as a key figure in advancing manufacturing techniques.

Collaborations

Throughout his career, Tanno has collaborated with notable colleagues, including Yasushi Kurata and Jun Matsuzawa. These partnerships have fostered innovation and contributed to the success of various projects within the semiconductor industry.

Conclusion

Kiyohito Tanno's contributions to semiconductor polishing technology exemplify his dedication to innovation. His patents and work at Hitachi Chemical Company, Ltd. continue to influence the industry positively.

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