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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6420269 B1

PDFFull Text
Date of Patent:
Jul. 16, 2002

Filed:

Dec. 30, 1997

Cerium oxide abrasive for polishing insulating films formed on substrate and methods for using the same

Applicant:
Inventors:

Jun Matsuzawa, Tsukuba, JP;

Yasushi Kurata, Tsukuba, JP;

Kiyohito Tanno, Hitachi, JP;

Yoshio Honma, Tokyo, JP;

Assignee:

Hitachi Chemical Company, Ltd., Tokyo, JP;

Attorney:

Griffin & Szipl, P.C.

Primary Examiner:

Michael J Sherry

Assistant Examiner:

Asok Kumar Sarkar

Int. Cl.
CPC ...
H01L 2/1302 ; H01L 2/1461 ;
U.S. Cl.
CPC ...
H01L 2/1302 ; H01L 2/1461 ;
Abstract

The invention relates to an abrasive containing a slurry of the cerium oxide grains dispersed in water. The Cerium oxide grains are obtained by adding hydrogen peroxide to an aqueous dispersion of cerium carbonate. The Cerium oxide grains are obtained by oxidizing a precipitate, which is formed through addition of ammonium hydrogencarbonate to an aqueous solution of cerium nitrate, with hydrogen peroxide. The Cerium oxide grains are obtained by neutralizing or alkallfying an aqueous solution of cerium ammonium nitrate.

Find Patent Forward Citations

Matsuzawa, Jun. (2002). Cerium oxide abrasive for polishing insulating films formed on substrate and methods for using the same (U.S. Patent No. 6420269). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6420269

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