Hitachi, Japan

Jun Matsuzawa



Average Co-Inventor Count = 5.2

ph-index = 8

Forward Citations = 218(Granted Patents)


Location History:

  • Tsukuba, JP (1992 - 2010)
  • Hitachi, JP (1991 - 2013)
  • Ibaraki-ken, JP (2002 - 2013)

Company Filing History:


Years Active: 1991-2013

where 'Filed Patents' based on already Granted Patents

22 patents (USPTO):

Title: Innovative Contributions of Jun Matsuzawa in Semiconductor Technology

Introduction

Jun Matsuzawa is a renowned inventor based in Hitachi, Japan, with an impressive portfolio of 22 patents. His work primarily focuses on innovations in abrasive materials and methods for polishing that are crucial in semiconductor manufacturing. Matsuzawa's inventions have significantly contributed to the advancement of technologies used in the production of semiconductor devices.

Latest Patents

Among Matsuzawa's latest patents are two notable inventions that enhance the efficiency and effectiveness of polishing processes. The first patent involves an abrasive comprising a slurry of medium and dispersed cerium oxide particles, designed to polish SiO insulating films or similar surfaces at high rates without causing scratches. The second patent introduces an abrasive liquid specifically for metals, which combines an oxidizing agent, a dissolving agent, dual protecting film-forming agents, and water to create a protective film during the polishing process. These innovative approaches mark a significant leap in the Semiconductor industry's material processing techniques.

Career Highlights

Matsuzawa has had a distinguished career, contributing to well-known companies including Hitachi Chemical Company, Ltd., and Hitachi, Ltd. His experience in these prominent organizations has facilitated the development of cutting-edge technologies within the semiconductor manufacturing sector.

Collaborations

Throughout his career, Jun Matsuzawa has collaborated with esteemed colleagues such as Hiroki Terazaki and Masato Yoshida. Their joint efforts in research and development have further propelled advancements in abrasive technologies and polishing methods, showcasing the power of teamwork in the field of innovation.

Conclusion

Jun Matsuzawa stands out as a pivotal figure in the realm of semiconductor technology, with his extensive patent portfolio reflecting his dedication to innovation. His revolutionary inventions not only improve existing processes but also pave the way for future advancements in the semiconductor industry. With continued collaboration and research, Matsuzawa is set to further impact this critical field of technology.

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