Location History:
- Kakegawa, JP (2008 - 2009)
- Shizuoka, JP (2010)
Company Filing History:
Years Active: 2008-2010
Title: Kiyohisa Takahashi: Innovator in Photoresist Technology
Introduction
Kiyohisa Takahashi is a notable inventor based in Kakegawa, Japan. He has made significant contributions to the field of photoresist technology, holding a total of 4 patents. His work focuses on improving the quality and efficiency of photoresist coatings used in semiconductor manufacturing.
Latest Patents
Takahashi's latest patents include innovative processes and compositions aimed at preventing development defects in photoresist applications. One of his key inventions is a process for preventing development defects, which involves a composition containing ammonium salts and fluorinated alkyl quaternary ammonium salts. This composition is applied to chemically amplified photoresist coatings on substrates with diameters of 8 inches or more. The process significantly reduces film thickness reduction during development treatment and enhances the formation of resist patterns without defects.
Another notable patent is for a protected polyvinyl alcohol (PVA) auxiliary for fine pattern formation. This modified PVA is designed to minimize high-molecular weight components, ensuring a more effective application in creating fine patterns. The process involves heating and crosslinking the coated layer, resulting in a hole pattern that meets the resolution limits of light exposure without development defects.
Career Highlights
Kiyohisa Takahashi is currently employed at Az Electronic Materials USA Corp., where he continues to innovate in the field of materials science. His expertise in photoresist technology has positioned him as a valuable asset to the company and the industry at large.
Collaborations
Throughout his career, Takahashi has collaborated with talented individuals such as Yusuke Takano and Masato Nishikawa. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Kiyohisa Takahashi's contributions to photoresist technology exemplify the impact of innovation in the semiconductor industry. His patents not only address critical challenges but also pave the way for advancements in manufacturing processes.