Zhuhai, China

Kingyuen Wong

This inventor holds 2 USPTO granted patents. Top assignee: Innoscience (Zhuhai) Technology Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kingyuen Wong. Retrieved from https://idiyas.com/inventor/kingyuen-wong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Kingyuen Wong: Innovator in Semiconductor Technology

Introduction

Kingyuen Wong is a prominent inventor based in Zhuhai, China. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to device manufacturing.

Latest Patents

Wong's latest patents include advancements in semiconductor devices and methods of manufacturing them. One of his notable inventions is a semiconductor device that comprises a substrate, a channel layer, a barrier layer, a gate, a strained layer, and a passivation layer. The design ensures that the channel layer is positioned on the substrate, while the barrier layer is placed on top of the channel layer. The gate is situated on the barrier layer, and the strained layer is also positioned on the barrier layer. The passivation layer, which differs in material from the strained layer, covers both the gate and the strained layer.

Another significant patent is related to a high electron mobility transistor (HEMT) and its fabrication method. This HEMT includes a substrate, a channel layer on the substrate, a barrier layer on the channel layer, and a semiconductor gate on the barrier layer. A metal gate, which has a trapezoidal cross-sectional shape, is placed on the semiconductor gate, with a passivation layer directly contacting the metal gate. The design ensures that a first surface of the metal gate contacts a first surface of the semiconductor gate, with the edge of the metal gate's first surface located within the edge of the semiconductor gate's first surface.

Career Highlights

Wong is currently employed at Innoscience Technology Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing efficient and advanced semiconductor devices that have potential applications in various electronic systems.

Collaborations

Wong collaborates with talented individuals in his field, including Ming-Hong Chang and Han-Chin Chiu. Their combined expertise contributes to the innovative environment at Innoscience Technology Co., Ltd.

Conclusion

Kingyuen Wong's contributions to semiconductor technology through his patents reflect his dedication to innovation and excellence in the field. His work continues to influence the development of advanced electronic devices, showcasing the importance of inventors in driving technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…