Ayase, Japan

Kimiaki Tamano

This inventor holds 4 USPTO granted patents and 2 published patent applications and 3 EPO patents. Top assignee: Tosoh Corporation. Active years: 2015-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kimiaki Tamano. Retrieved from https://idiyas.com/inventor/kimiaki-tamano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 100.0

 

Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 20(Granted Patents)


Location History:

  • Kanagawa, JP (2016)
  • Ayase, JP (2015 - 2019)

Company Filing History:


Years Active: 2015-2019

Loading Chart...
Loading Chart...
4 patents (USPTO):Explore Patents

Title: Kimiaki Tamano: Innovator in Sputtering Technology

Introduction

Kimiaki Tamano is a notable inventor based in Ayase, Japan. He has made significant contributions to the field of sputtering technology, holding a total of 4 patents. His work focuses on improving the quality and efficiency of sputtering targets used in various applications.

Latest Patents

One of his latest patents is for a cylindrical sputtering target and the process for producing it. This invention provides a cylindrical ceramic sputtering target that significantly reduces the occurrence of cracks, chips, extraordinary discharge, and nodules. The manufacturing process involves filling a molten bonding material in a cavity defined by a cylindrical ceramic target material and a cylindrical base material. The cooling of the molten bonding material is initiated from one end toward the other in a cylindrical axial direction, ensuring a high-quality product. The patent specifies that, as observed by an X-ray radiograph of the bonding material, the total area of portions where no bonding material exists is 10 cm or less per 50 cm of X-ray radiograph area, with a maximum area of 9 cm or less.

Another significant patent by Tamano is related to a complex oxide sintered body, sputtering target, and a transparent conductive oxide film. This invention specifies the atomic ratios of zirconium, indium, and yttrium in the complex oxide sintered body, which is crucial for the performance of the sputtering target and the resulting transparent conductive oxide film.

Career Highlights

Kimiaki Tamano is currently employed at Tosoh Corporation, a leading company in the chemical and materials industry. His work at Tosoh has allowed him to focus on innovative solutions in sputtering technology, contributing to advancements in the field.

Collaborations

Tamano has collaborated with notable coworkers such as Tetsuo Shibutami and Shigehisa Todoko. Their combined expertise has fostered a productive environment for innovation and development in their projects.

Conclusion

Kimiaki Tamano's contributions to sputtering technology through his patents and work at Tosoh Corporation highlight his role as a significant inventor in the field. His innovative approaches continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…