Tosoh Corporation

Kimiaki Tamano

Tetsuo Shibutami

Hideto Kuramochi

Kenichi Itoh

Ryo Akiike

Hitoshi Iigusa

Shigehisa Todoko

Provided is a cylindrical ceramic sputtering target, which significantly reduces the occurrence of a crack, a chip, extraordinary discharge and a nodule. By filling a molten bonding material in a cavity defined by a cylindrical ceramic target material and a cylindrical base material, starting cooling the molten bonding material from its one end toward its other end in a cylindrical axial direction in sequence, and further filling the molten bonding material in the cavity during cooling, a cylindrical ceramic sputtering target is manufactured so as to be characterized in that as observed by an X-ray radiograph of the bonding material, the total area of portions where no bonding material exists is 10 cmor less per 50 cmof X-ray radiograph area, and the maximum area of the portions where no bonding material exists is 9 cmor less.

Cylindrical sputtering target and process for producing the same

The present invention provides a complex oxide sintered bodywherein Zr/(In+Zr+Y) is 0.05 to 4.5 at % and Y/(In+Zr+Y) is 0.005 to 0.5 at % in an atomic ratio when indium, zirconium, and yttrium are designated by In, Zr, and Y, respectively. Moreover, the present invention provides a sputtering target including the complex oxide sintered bodyand a transparent conductive oxide film obtained by sputtering the sputtering target.

Complex oxide sintered body, sputtering target, transparent conductive oxide film, and method for producing same

To provide a composite oxide sintered body from which an oxide transparent conductive film having lower light absorption properties in a wide wavelength region and having a low resistance can be obtained, and an oxide transparent conductive film. A composite oxide sintered body containing indium, zirconium, hafnium and oxygen, wherein the atomic ratio of the elements constituting the sintered body satisfies the following formulae, where In, Zr and Hf are respectively contents of indium, zirconium and hafnium:Zr/(In+Zr+Hf)=0.05 to 4.5 at %Hf/(In+Zr+Hf)=0.0002 to 0.15 at %.

Composite oxide sintered body and oxide transparent conductive film

Provided is a cylindrical sputtering target which attains a high production yield in a film-forming process even when a film is formed by sputtering with a long cylindrical sputtering target constituted by a plurality of cylindrical target materials. A multi-divided cylindrical sputtering target formed by bonding a cylindrical base and a plurality of cylindrical target materials together with a bonding material has a divided portion where adjacent cylindrical target materials are arranged with a gap therebetween, while outer peripheral faces of the adjacent cylindrical target materials have a step of 0.5 mm or less therebetween in the divided portion. Such a target is obtained by fixing the cylindrical target materials with reference to the outer peripheral faces of the cylindrical target materials when arranging the cylindrical target materials with reference to the cylindrical base.

Growing community of inventors

Ayase, Japan

Kimiaki Tamano