The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2019
Filed:
Dec. 28, 2015
Tosoh Corporation, Shunan-shi, Yamaguchi, JP;
Shigehisa Todoko, Tokyo, JP;
Kimiaki Tamano, Ayase, JP;
Kenichi Itoh, Ayase, JP;
Tetsuo Shibutami, Ayase, JP;
TOSOH CORPORATION, Shunan-shi, Yamaguchi, JP;
Abstract
Provided is a cylindrical ceramic sputtering target, which significantly reduces the occurrence of a crack, a chip, extraordinary discharge and a nodule. By filling a molten bonding material in a cavity defined by a cylindrical ceramic target material and a cylindrical base material, starting cooling the molten bonding material from its one end toward its other end in a cylindrical axial direction in sequence, and further filling the molten bonding material in the cavity during cooling, a cylindrical ceramic sputtering target is manufactured so as to be characterized in that as observed by an X-ray radiograph of the bonding material, the total area of portions where no bonding material exists is 10 cmor less per 50 cmof X-ray radiograph area, and the maximum area of the portions where no bonding material exists is 9 cmor less.