Marlborough, MA, United States of America

Kevin Y Wang

USPTO Granted Patents = 5 

 

Average Co-Inventor Count = 5.7

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Marlborough, MA (US) (2016 - 2018)
  • Shrewsbury, MA (US) (2016 - 2023)

Company Filing History:


Years Active: 2016-2023

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5 patents (USPTO):Explore Patents

Title: Kevin Y Wang: Innovator in Electronic Materials

Introduction

Kevin Y Wang is a prominent inventor based in Marlborough, MA (US), known for his contributions to the field of electronic materials. With a total of five patents to his name, Wang has made significant advancements in the development of photosensitive compositions and polymer coatings.

Latest Patents

Wang's latest patents include a photosensitive bismaleimide composition, which comprises a photoinitiator and a bismaleimide component. This innovative composition is particularly useful in electronic devices. Another notable patent involves arylcyclobutenes, which are multi-functional monomers that aid in the preparation of arylcyclobutene-based polymer coatings. These coatings are designed to have reduced stress and are beneficial in the manufacturing of electronic devices.

Career Highlights

Throughout his career, Kevin Y Wang has worked with reputable companies such as Rohm & Haas Electronic Materials LLC and Dow Global Technologies LLC. His experience in these organizations has allowed him to refine his expertise in electronic materials and contribute to various innovative projects.

Collaborations

Wang has collaborated with notable colleagues, including Michael K Gallagher and Robert K Barr, further enhancing his work in the field of electronic materials.

Conclusion

Kevin Y Wang's contributions to electronic materials through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the development of advanced technologies in electronic devices.

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