Kevin M Dowdle

Title: Kevin M Dowdle: Innovator in Semiconductor Technology

Introduction

Kevin M Dowdle is a notable inventor based in Pocatello, ID (US). He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to microelectronic devices and manufacturing methods.

Latest Patents

Kevin's latest patents focus on semiconductor devices and methods for backside photo alignment. Various embodiments of microelectronic devices and methods of manufacturing are described in these patents. In one embodiment, a method for aligning an electronic feature to a through-substrate via includes forming a self-aligned alignment feature with a wall around at least a portion of the through-substrate via (TSV). This method involves aligning a photolithography tool to the self-aligned alignment feature. In some embodiments, the self-aligned alignment feature is defined by the topography of a seed material at the backside of the device.

Career Highlights

Kevin M Dowdle is currently employed at Micron Technology Incorporated, where he continues to develop innovative solutions in semiconductor technology. His work has contributed to advancements in the manufacturing processes of microelectronic devices.

Collaborations

Some of Kevin's coworkers include Brandon P Wirz and Keith E Ypma, who collaborate with him on various projects within the company.

Conclusion

Kevin M Dowdle is a prominent figure in the semiconductor industry, recognized for his innovative patents and contributions to microelectronic device manufacturing. His work at Micron Technology Incorporated continues to influence the field significantly.