Er-Lin Town, Taiwan

Kevin Hung


Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Chang Hua Hsien, TW (2010)
  • Hsin-Chu, TW (2013)
  • Er-Lin Town, TW (2012 - 2019)

Company Filing History:


Years Active: 2010-2019

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5 patents (USPTO):Explore Patents

Title: Kevin Hung: Innovator in Photolithographic Processes

Introduction

Kevin Hung is a notable inventor based in Er-Lin Town, Taiwan. He has made significant contributions to the field of photolithography, particularly in methods for determining the quality of light sources. With a total of 5 patents to his name, Hung's work is recognized for its innovative approach and practical applications.

Latest Patents

One of Kevin Hung's latest patents focuses on methods for determining the quality of a light source applied to a photolithographic process. This invention involves exposing an image sensor array to light from a light source. The process includes collecting addresses and respective intensities corresponding to various locations on a pupil map that represents the intensity of the light from the image sensor array. The invention defines at least one of an inner curve and an outer curve of the pupil map based on the collected data. The light source is deemed suitable for a photolithographic process if the addresses exhibit a predetermined pattern relative to the defined curves.

Career Highlights

Kevin Hung is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in photolithographic technology.

Collaborations

Throughout his career, Kevin has collaborated with talented individuals such as Nan-Jung Chen and Jui-Chung Peng. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Kevin Hung is a distinguished inventor whose work in photolithography has led to significant advancements in the field. His innovative methods for assessing light source quality are paving the way for improved processes in semiconductor manufacturing.

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