Palo Alto, CA, United States of America

Keumsil Lee

USPTO Granted Patents = 4 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2022-2025

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4 patents (USPTO):Explore Patents

Title: Keumsil Lee: Innovator in Semiconductor Inspection Technologies

Introduction

Keumsil Lee is a prominent inventor based in Palo Alto, California, known for his significant contributions to semiconductor inspection technologies. With a total of four patents to his name, Lee has developed innovative methods that enhance the accuracy and efficiency of semiconductor manufacturing processes.

Latest Patents

Among his latest patents is the "FIB-SEM 3D tomography for measuring shape deviations of HAR structures." This patent describes a 3D tomographic inspection method that allows for the detailed inspection of semiconductor features. The method involves obtaining a 3D tomographic image and selecting multiple 2D cross-section images. It also includes identifying contours of high aspect ratio (HAR) structures and extracting deviation parameters that describe fabrication errors such as displacement and shape deviations.

Another notable patent is "Contact area size determination between 3D structures in an integrated semiconductor sample." This method determines the size of the contact area between two 3D structures within an integrated semiconductor sample. The process includes obtaining cross-section images, performing image registration, and determining a 3D model that represents the structures, ultimately assessing their relative overlap.

Career Highlights

Keumsil Lee currently works at Carl Zeiss SMT GmbH, a company renowned for its advanced optical systems and semiconductor manufacturing equipment. His work at this organization has positioned him as a key player in the field of semiconductor technology.

Collaborations

Lee collaborates with notable colleagues such as Thomas Korb and Eugen Foca, contributing to the advancement of semiconductor inspection methodologies.

Conclusion

Keumsil Lee's innovative patents and contributions to semiconductor inspection technologies underscore his importance in the field. His work continues to influence the efficiency and accuracy of semiconductor manufacturing processes.

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