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For the Inventor, By the Inventor

Scottsdale, AZ, United States of America

Kerry Joseph Nagel

This inventor holds 57 USPTO granted patents and 20 published patent applications and 14 EPO patents, primarily in Magnetoresistive Devices (CPC class H01L). Top assignees: Everspin Technologies, Inc., Freescale Semiconductor,inc.. Active years: 2009-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kerry Joseph Nagel. Retrieved from https://idiyas.com/inventor/kerry-joseph-nagel

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 57 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.2

ph-index = 9

Forward Citations = 250(Granted Patents)

Forward Citations (Not Self Cited) = 81(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Phoenix, AZ (US) (2009 - 2015)
  • Scottsdale, AZ (US) (2014 - 2024)

Company Filing History:

goldMedal56 out of 359 
 
Everspin Technologies, Inc.
 patents
silverMedal1 out of 5,491 
 
Freescale Semiconductor,inc.
 patents

Years Active: 2009-2026

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Areas of Expertise:
Magnetoresistive Devices
Integrated Circuits
Manufacturing Techniques
Fabrication Methods
Device Design
Magnetoresistive Stack
Dielectric Layers
Process Integration
Magnetic Device Alignment
Etch Process
Stacked Structures
Device Encapsulation
57 patents (USPTO):Explore Patents
1. 12532665 - Method of fabricating a magnetoresistive bit from a magnetoresistive stack (2026-01-20),
2. 12477957 - Magnetoresistive devices and methods of fabricating magnetoresistive devices (2025-11-18),
3. 12369495 - Magnetoresistive stack/structure and method of manufacturing same (2025-07-22),
4. 12290001 - Method of manufacturing integrated circuit using encapsulation during an etch process (2025-04-29),
5. 12075630 - Methods of forming magnetoresistive devices and integrated circuits (2024-08-27),
6. 12063865 - Method of manufacturing integrated circuit using encapsulation during an etch process (2024-08-13),
7. 12022738 - Methods for manufacturing magnetoresistive stack devices (2024-06-25),
8. 11925122 - Magnetoresistive structure having two dielectric layers, and method of manufacturing same (2024-03-05),
9. 11778919 - Magnetoresistive stack/structure and method of manufacturing same (2023-10-03),
10. 11631806 - Method of integration of a magnetoresistive structure (2023-04-18),
11. 11502247 - Magnetoresistive devices and methods of fabricating magnetoresistive devices (2022-11-15),
12. 11482570 - Methods of forming magnetoresistive devices and integrated circuits (2022-10-25),
13. 11335728 - Methods of forming magnetoresistive devices and integrated circuits (2022-05-17),
14. 11264564 - Magnetoresistive devices and methods therefor (2022-03-01),
15. 11211553 - Magnetoresistive devices and methods of fabricating such devices (2021-12-28),

Title: The Innovative Journey of Kerry Joseph Nagel

Introduction: Kerry Joseph Nagel, a pioneering inventor based in Scottsdale, AZ, has made significant contributions to the field of technology and innovation.

Latest Patents: Kerry Joseph Nagel holds several patents in various technological domains, showcasing his versatility and creativity in inventing new solutions to complex problems.

Career Highlights: With a career spanning several decades, Kerry Joseph Nagel has been at the forefront of technological advancements, consistently pushing the boundaries of innovation. His work has not only revolutionized industries but has also inspired a new generation of inventors.

Collaborations: Throughout his career, Kerry Joseph Nagel has collaborated with leading tech companies, research institutions, and universities to further his innovative projects. These collaborations have led to groundbreaking inventions that have had a lasting impact on society.

Conclusion: Kerry Joseph Nagel's passion for innovation and his relentless pursuit of excellence have solidified his position as a visionary inventor. His contributions to the world of technology continue to shape the way we live and work, leaving a lasting legacy for future generations to build upon.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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