The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2024

Filed:

Aug. 10, 2020
Applicant:

Everspin Technologies, Inc., Chandler, AZ (US);

Inventors:

Sanjeev Aggarwal, Scottsdale, AZ (US);

Sarin A. Deshpande, San Jose, CA (US);

Kerry Joseph Nagel, Scottsdale, AZ (US);

Assignee:

EVERSPIN TECHNOLOGIES, INC., Chandler, AZ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10N 50/01 (2023.01); H10B 61/00 (2023.01);
U.S. Cl.
CPC ...
H10N 50/01 (2023.02); H10B 61/00 (2023.02); H10B 61/22 (2023.02);
Abstract

A method of fabricating a magnetoresistive bit from a magnetoresistive stack includes etching through a first portion of the magnetoresistive stack using a first etch process to form one or more sidewalls. At least a portion of the sidewalls includes redeposited material after the etching. The method also includes modifying at least a portion of the redeposited material on the sidewalls, and etching through a second portion of the magnetoresistive stack after the modifying step. The magnetoresistive stack may include a first magnetic region, an intermediate region disposed over the first magnetic region, and a second magnetic region disposed over the intermediate region.


Find Patent Forward Citations

Aggarwal, Sanjeev. (2024). Method of manufacturing integrated circuit using encapsulation during an etch process (U.S. Patent No. 12063865). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12063865

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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