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For the Inventor, By the Inventor

Koshi, Japan

Kento Kurusu

This inventor holds 8 USPTO granted patents and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2014-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kento Kurusu. Retrieved from https://idiyas.com/inventor/kento-kurusu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8 

% Patents Active = 100.0

Average Co-Inventor Count = 1.6

ph-index = 3

Forward Citations = 36(Granted Patents)


Location History:

  • Koshi, JP (2016 - 2020)
  • Kumamoto, JP (2014 - 2022)

Company Filing History:

goldMedal8 out of 10,883 
 
Tokyo Electron Limited
 patents

Years Active: 2014-2022

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8 patents (USPTO):Explore Patents
1. 11482428 - Substrate processing apparatus and substrate processing method (2022-10-25),
2. 10643865 - Substrate cleaning apparatus (2020-05-05),
3. 10290518 - Substrate liquid processing apparatus (2019-05-14),
4. D843118 - Cleaning brush (2019-03-19),
5. 9691646 - Substrate processing apparatus, substrate detection method of substrate processing apparatus and storage medium (2017-06-27),
6. 9238256 - Substrate processing scrubber, substrate processing apparatus and substrate processing method (2016-01-19),
7. D719591 - Substrate cleaning tool (2014-12-16),
8. D719199 - Substrate cleaning tool (2014-12-09),

Title: Kento Kurusu: Innovator in Substrate Processing Technologies

Introduction

Kento Kurusu is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 8 patents. His work focuses on developing advanced apparatuses and methods that enhance the efficiency and effectiveness of substrate processing.

Latest Patents

Among his latest innovations, Kurusu has developed a substrate processing apparatus that includes a substrate holder, a processing liquid supply nozzle, and a liquid receiving cup. This apparatus is designed to efficiently manage the processing liquid supplied to the substrate. Additionally, he has created a substrate cleaning apparatus that features a substrate holding unit, a brush, and a discharge portion. This cleaning apparatus is engineered to ensure thorough cleaning of substrates through innovative design and functionality.

Career Highlights

Kento Kurusu is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His role involves pioneering new technologies that push the boundaries of substrate processing. His contributions have been instrumental in advancing the capabilities of the equipment used in this critical sector.

Collaborations

Throughout his career, Kurusu has collaborated with notable colleagues, including Hidetaka Shinohara and Osamu Miyahara. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Kento Kurusu stands out as a key figure in the realm of substrate processing technologies. His inventive spirit and dedication to advancing the field are evident in his numerous patents and ongoing work at Tokyo Electron Limited.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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