The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2017
Filed:
Apr. 17, 2015
Tokyo Electron Limited, Tokyo, JP;
Kento Kurusu, Kumamoto, JP;
Kohei Mori, Kumamoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A liquid processing apparatus includes a substrate holding and rotating unit provided with a rotating plate and a substrate support unit, and a liquid supply unit. The rotating plate is connected to a rotating shaft and a central portion of the rotating shaft is exposed to outside through an opening of the rotating plate. A ring-shaped retro-reflective sheet is attached to the central portion of the rotating shaft. The central opened part of the ring-shaped retro-reflective sheet is positioned on the extended line of the central axis of the wafer holding and rotating unit. Further, a supply pipe penetrates through the central opened part of the retro-reflective sheet. Laser light is irradiated to the retro-reflective sheet from the slanted upper side, the reflected light is received by the laser light projecting/receiving part, and presence or absence of the wafer is detected by a substrate detection unit.