The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 19, 2016

Filed:

Feb. 06, 2013
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Kento Kurusu, Koshi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 1/00 (2006.01); B08B 1/04 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/304 (2006.01);
U.S. Cl.
CPC ...
B08B 1/002 (2013.01); B08B 1/04 (2013.01); H01L 21/02074 (2013.01); H01L 21/304 (2013.01); H01L 21/67046 (2013.01); H01L 21/67051 (2013.01);
Abstract

A removal target can be effectively removed from a substrate. In a substrate processing apparatusand a substrate processing method by using a substrate processing scrubberof removing the removal target from the substrate, the substrate processing scrubberincludes a baseconnected to a rotation shaft; scrubber main bodiesprovided at the baseand arranged at a regular distance in a rotational direction of the base; and a processing liquid supply openingformed at the baseand configured to supply a processing liquid to the scrubber main bodies. Further, an area of an attachment surface of each of the scrubber main bodiesto be attached to the baseis larger than an area of a contact surface of each of the scrubber main bodiesto be brought into contact with the substrate


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