Nirasaki, Japan

Kentaro Asakura


Average Co-Inventor Count = 2.6

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Kai, JP (2011)
  • Nirasaki, JP (2008 - 2019)
  • Yamanashi, JP (2023)

Company Filing History:


Years Active: 2008-2025

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8 patents (USPTO):Explore Patents

Title: Kentaro Asakura: Innovator in Substrate Processing Technology

Introduction

Kentaro Asakura is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 8 patents. His work focuses on improving methods and mechanisms for substrate placement in processing apparatuses.

Latest Patents

Asakura's latest patents include innovative solutions such as a substrate placing method and a substrate placing mechanism. The substrate placing method involves placing a substrate on a designated surface within a substrate processing apparatus. This method utilizes a lift pin that can protrude and retract, allowing for precise substrate transfer. The substrate placing mechanism features a stage device that includes a heating part to enhance the efficiency of the substrate processing.

Career Highlights

Kentaro Asakura is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in advancing substrate processing technologies, which are critical for the production of semiconductor devices.

Collaborations

Asakura has collaborated with notable colleagues in his field, including Hiroo Kawasaki and Kensaku Narushima. These collaborations have further enriched his contributions to substrate processing technology.

Conclusion

Kentaro Asakura's innovative work in substrate processing technology has established him as a key figure in the industry. His patents reflect a commitment to enhancing the efficiency and effectiveness of substrate placement methods.

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