Kensaku Igarashi

Title: Innovations by Kensaku Igarashi

Introduction

Kensaku Igarashi is a notable inventor based in Nishigo-mura, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of six patents. His work focuses on improving the quality and efficiency of semiconductor silicon wafer cleaning processes.

Latest Patents

Igarashi's latest patents include an innovative apparatus and method for cleaning semiconductor silicon wafers. One of the key methods involves an ozone water treatment step after polishing, followed by a first ultrasonic-wave-ozone-water treatment at room temperature. This process includes immersing the wafer in ozone water while applying ultrasonic waves. The second ultrasonic-wave-ozone-water treatment further enhances the cleaning process by rotating the wafer and applying ultrasonic waves again. This method effectively suppresses defects on the wafer surface and improves surface roughness, ultimately enhancing wafer quality and reducing costs. Another method he developed involves supplying hydrofluoric acid to the silicon wafer while rotating it, followed by a treatment with ozone water. This approach minimizes the adhesion of water marks and particles, thereby improving wafer quality.

Career Highlights

Kensaku Igarashi is currently employed at Shin-Etsu Handotai Co., Ltd., a leading company in the semiconductor industry. His work has been instrumental in advancing cleaning techniques for silicon wafers, which are critical in semiconductor manufacturing.

Collaborations

Igarashi collaborates with fellow inventor Tatsuo Abe, contributing to the development of innovative solutions in the semiconductor field.

Conclusion

Kensaku Igarashi's contributions to semiconductor technology through his patents and innovative methods have significantly impacted the industry. His work continues to enhance the quality and efficiency of semiconductor manufacturing processes.