This inventor holds 3 USPTO granted patents. Top assignee: Allied Corporation. Active years: 1984-1986.
Location History:
- Cheektowaga, NY (US) (1984)
- Buffalo, NY (US) (1986)
Company Filing History:
Years Active: 1984-1986
Title: Kenneth M Thrun: Innovator in Plasma Etching Technology
Introduction
Kenneth M Thrun is a notable inventor based in Buffalo, NY (US). He has made significant contributions to the field of plasma etching technology, holding a total of 3 patents. His work has been instrumental in advancing processes used in integrated circuit manufacturing.
Latest Patents
One of his latest patents is the SF6/nitriding gas/oxidizer plasma etch system. This invention discloses a gaseous mixture of SF.sub.6, a nitriding gas component, and an oxidizer gas component as an effective SiO.sub.2 etchant. The enhanced selectivity for SiO.sub.2 over silicon or polysilicon is achieved by adding an oxidizing gas to the SF.sub.6 nitriding gas plasma etchant. The optional addition of an inert diluent gas did not substantially change these results. Another significant patent is the boron trifluoride system for plasma etching of silicon dioxide. This patent describes BF.sub.3 based mixtures for selectively etching thin layers of silicon dioxide over silicon. The process reveals that when trace amounts of formaldehyde are added to the etch system, the rate on oxide increases markedly, while the effect on silicon is not substantial. Again, the optional addition of an inert diluent gas did not substantially change these results.
Career Highlights
Kenneth M Thrun has been associated with Allied Corporation, where he has applied his expertise in plasma etching technology. His innovative approaches have contributed to the development of more efficient manufacturing processes in the semiconductor industry.
Collaborations
Throughout his career, Kenneth has collaborated with notable colleagues such as Stephen M Bobbio and Marie C Flanigan. These collaborations have further enriched his work and expanded the impact of his inventions.
Conclusion
Kenneth M Thrun's contributions to plasma etching technology have significantly advanced the field, making him a key figure in the industry. His innovative patents continue to influence the manufacturing processes of integrated circuits.