The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 1986
Filed:
Nov. 05, 1984
Applicant:
Inventors:
Stephen M Bobbio, Winterville, GA (US);
Marie C Flanigan, Lockport, NY (US);
Kenneth M Thrun, Buffalo, NY (US);
Ralph L DePrenda, Amherst, NY (US);
Assignee:
Allied Corporation, Morris Township, Morris County, NJ (US);
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ; H01L / ;
U.S. Cl.
CPC ...
156643 ; 156646 ; 156653 ; 156657 ; 1566591 ; 156662 ; 20419237 ; 252 791 ;
Abstract
A gaseous mixture of SF.sub.6, a nitriding gas component and an oxidizer gas component is disclosed as an effective SiO.sub.2 etchant having enhanced selectively for use in either the plasma or reactive ion etch process. By adding an oxidizing gas to the SF.sub.6 nitriding gas plasma etchant, the selectively for SiO.sub.2 over silicon or polysilicon is marked improved. The optional addition of an inert diluent gas did not substantially change these results.