Company Filing History:
Years Active: 1986-1988
Title: Ralph L DePrenda: Innovator in Integrated Circuit Technology
Introduction
Ralph L DePrenda is a notable inventor based in Amherst, NY (US), recognized for his contributions to the field of integrated circuit technology. With a total of 3 patents, he has made significant advancements that enhance the reliability and efficiency of semiconductor devices.
Latest Patents
One of his latest patents is focused on "Cyclosilazane polymers as dielectric films in integrated circuit." This patent presents an improved method for depositing dielectric films in the fabrication of integrated circuits (ICs). The method utilizes a solution of polymers derived from cyclosilazanes, which are employed to deposit dielectric films on semiconductor substrates using the spin-on technique. These spin-on films effectively planarize the underlying substrate topography, making them particularly advantageous in multilevel metallization processes. This innovation allows for a highly uniform and continuous deposition of subsequent metallization layers, resulting in improved yield and reliability of ICs.
Another significant patent is the "SF6/nitriding gas/oxidizer plasma etch system." This patent discloses a gaseous mixture of SF6, a nitriding gas component, and an oxidizer gas component as an effective SiO2 etchant. The enhanced selectivity for SiO2 over silicon or polysilicon is achieved by adding an oxidizing gas to the SF6 nitriding gas plasma etchant. The optional addition of an inert diluent gas does not substantially alter these results, showcasing the effectiveness of this innovative etching system.
Career Highlights
Ralph L DePrenda is currently associated with Allied Corporation, where he continues to develop and refine technologies that impact the semiconductor industry. His work has been instrumental in advancing the methods used in integrated circuit fabrication.
Collaborations
Throughout his career, Ralph has collaborated with notable colleagues, including Stephen M Bobbio and Marie C Flanigan. These partnerships have contributed to the successful development of his innovative technologies.
Conclusion
Ralph L DePrenda's contributions to integrated circuit technology through his patents demonstrate his commitment to innovation in the semiconductor field. His work not only enhances the performance of integrated circuits but also sets a foundation for future advancements in the industry.