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For the Inventor, By the Inventor

Kawasaki, Japan

Kenji Sugishima

This inventor holds 10 USPTO granted patents. Top assignee: Fujitsu Corporation. Active years: 1982-1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenji Sugishima. Retrieved from https://idiyas.com/inventor/kenji-sugishima-l1xtzc9f

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 10

% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 8

Forward Citations = 319(Granted Patents)


Location History:

  • Inagi, JP (1992)
  • Kawasaki, JP (1982 - 1996)

Company Filing History:

goldMedal10 out of 39,378 
 
Fujitsu Corporation
 patents

Years Active: 1982-1996

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10 patents (USPTO):Explore Patents
1. 5557105 - Pattern inspection apparatus and electron beam apparatus (1996-09-17),
2. 5541023 - X-ray mask, method of manufacturing the x-ray mask and exposure method (1996-07-30),
3. 5430292 - Pattern inspection apparatus and electron beam apparatus (1995-07-04),
4. 5384463 - Pattern inspection apparatus and electron beam apparatus (1995-01-24),
5. 5126220 - Reticle for photolithographic patterning (1992-06-30),
6. 4748646 - X-ray lithography system (1988-05-31),
7. 4684315 - Frictionless supporting apparatus (1987-08-04),
8. 4678919 - Electron beam exposure method and apparatus (1987-07-07),
9. 4377031 - Method of making Schottky barrier diode by selective beam-crystallized (1983-03-22),
10. 4352724 - Method of manufacturing a semiconductor device (1982-10-05),

Title: Kenji Sugishima: Innovator in Electron Beam Technology

Introduction

Kenji Sugishima is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of electron beam technology, holding a total of 10 patents. His work focuses on advanced inspection apparatuses that enhance the accuracy and efficiency of pattern inspections.

Latest Patents

Among his latest patents is a pattern inspection apparatus designed to quickly and accurately inspect samples such as masks or wafers. This apparatus utilizes electron beams to detect secondary or backscattered electrons from the inspection sample. It features an electron beam generator with at least one electron gun, a movable support for the inspection sample, and a detector unit with multiple electron detecting elements. Another notable patent involves an X-ray mask and a method for manufacturing it, which employs a beta-crystalline tantalum film to reduce strain during thermal treatment processes.

Career Highlights

Kenji Sugishima has worked with notable companies, including Fujitsu Corporation and Fujitsu Limited. His experience in these organizations has allowed him to develop innovative technologies that have advanced the field of electron beam inspection.

Collaborations

Throughout his career, Sugishima has collaborated with talented individuals such as Ichiro Honjo and Masaki Yamabe. These partnerships have contributed to the success of his inventions and the development of new technologies.

Conclusion

Kenji Sugishima's contributions to electron beam technology and pattern inspection apparatuses have made a significant impact in the field. His innovative patents and collaborations highlight his dedication to advancing technology and improving inspection processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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