The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 1996
Filed:
May. 28, 1993
Kazuaki Kondo, Kawasaki, JP;
Kenji Sugishima, Kawasaki, JP;
Fujitsu Limited, , JP;
Abstract
An X-ray absorbing film including an X-ray absorbing pattern of an X-ray mask uses .beta.-crystalline tantalum having the plane orientation of (002). The .beta.-crystalline tantalum film is formed by depositing tantalum on an amorphous layer. Because the film stress change due to heat is small, the strain of the X-ray absorbing pattern formed through a thermal treatment process is decreased. When heating the X-ray absorbing film before implanting ions into the film, the stress change of the film after implanted with ions decreases and the X-ray absorbing pattern strain also decreases.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile