The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 1987
Filed:
Jul. 14, 1986
Kenji Sugishima, Kawasaki, JP;
Kenji Nakagawa, Isehara, JP;
Fujitsu Limited, Kanagawa, JP;
Abstract
An electron beam exposure system for producing a desired pattern on a workpiece. The pattern is specified by predetermined pattern data. The pattern data is modified with correction data. The correction data is obtained from information indicating variations on the level of the surface of the workpiece due to an elastic deformation thereof during the exposure process. With the use of the correction data, the desired pattern is correctly reproduced as intended when the workpiece is fully supported and the surface thereof recovers its flatness.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile