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For the Inventor, By the Inventor

Hamamatsu, Japan

Kenichi Ohtsuka

This inventor holds 10 USPTO granted patents. Top assignee: Hamamatsu-Photonics K.k.. Active years: 2014-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kenichi Ohtsuka. Retrieved from https://idiyas.com/inventor/kenichi-ohtsuka-cmjtnvaa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 10

% Patents Active = 60.0

Average Co-Inventor Count = 2.3

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:

goldMedal10 out of 3,143 
 
Hamamatsu-Photonics K.k.
 patents

Years Active: 2014-2026

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10 patents (USPTO):Explore Patents
1. 12742637 - Film thickness measuring device and film thickness measuring method (2026-09-22),
2. 12736327 - Film thickness measurement device and film thickness measurement method (2026-09-15),
3. 12729951 - Thickness-distribution measurement device and thickness-distribution measurement method (2026-09-08),
4. 12578183 - Film thickness measuring device and film thickness measuring method (2026-03-17),
5. 11988497 - Optical unit and film thickness measurement device (2024-05-21),
6. 11280604 - Film thickness measurement device, film thickness measurement method, film thickness measurement program, and recording medium for recording film thickness measurement program (2022-03-22),
7. 9846028 - Film thickness measurement method and film thickness measurement device (2017-12-19),
8. 8885173 - Film thickness measurement device and film thickness measurement method (2014-11-11),
9. 8699023 - Reflectivity measuring device, reflectivity measuring method, membrane thickness measuring device, and membrane thickness measuring method (2014-04-15),
10. 8649023 - Film thickness measurement device and measurement method (2014-02-11),

Title: Kenichi Ohtsuka: Innovator in Optical Measurement Technologies

Introduction

Kenichi Ohtsuka is a prominent inventor based in Hamamatsu, Japan. He has made significant contributions to the field of optical measurement technologies, holding a total of 10 patents. His work focuses on developing advanced devices that enhance the accuracy and efficiency of film thickness measurements.

Latest Patents

Ohtsuka's latest patents include an innovative optical unit and a film thickness measurement device. The optical unit is designed to handle measurement light across a spectrum from the ultraviolet to the visible region. It features an optical system that condenses the measurement light while intentionally causing chromatic aberration. This design allows the unit to effectively image light in the ultraviolet region while excluding visible light.

The film thickness measurement device comprises a light output unit that emits measurement light, a spectroscopic detection unit that captures detection light, and an analysis unit that compares measured reflectance with theoretical reflectance. This device is capable of analyzing the thickness of multiple films by determining optimal solutions based on reflectance data across different wavelength ranges.

Career Highlights

Kenichi Ohtsuka is associated with Hamamatsu Photonics K.K., a company renowned for its advancements in optical technologies. His work has significantly impacted the field, leading to improved methodologies for film thickness measurement.

Collaborations

Ohtsuka has collaborated with notable colleagues, including Tetsuhisa Nakano and Motoyuki Watanabe. Their combined expertise has contributed to the development of innovative solutions in optical measurement.

Conclusion

Kenichi Ohtsuka's contributions to optical measurement technologies exemplify the importance of innovation in enhancing measurement accuracy. His patents reflect a commitment to advancing the field and improving the tools available for researchers and industries alike.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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