Toyama, Japan

Kenichi Fujimoto


Average Co-Inventor Count = 9.2

ph-index = 1


Company Filing History:


Years Active: 2013-2024

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3 patents (USPTO):Explore Patents

Title: Kenichi Fujimoto: Innovator in Substrate Processing Technology

Introduction

Kenichi Fujimoto is a notable inventor based in Toyama, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 3 patents. His work focuses on enhancing the efficiency and reliability of substrate processing apparatuses.

Latest Patents

Fujimoto's latest patents include a substrate processing apparatus, a device management controller, and a recording medium. The substrate processing apparatus features a device management controller that includes a parts management control part, which monitors the state of the apparatus's components. Additionally, it has a device state monitoring control part that ensures the integrity of device data derived from the operational state of these parts. Furthermore, a data matching control part is included to monitor facility data provided from a factory facility to the apparatus. This innovative controller is designed to evaluate the operation state of the apparatus based on various monitoring results, enhancing overall performance and reliability.

Career Highlights

Throughout his career, Kenichi Fujimoto has worked with prominent companies such as Kokusai Electric Corporation and Hitachi Kokusai Electric Inc. His experience in these organizations has allowed him to develop and refine his expertise in substrate processing technologies.

Collaborations

Fujimoto has collaborated with notable colleagues, including Kazuhide Asai and Kazuyoshi Yamamoto. These partnerships have contributed to the advancement of technology in their respective fields.

Conclusion

Kenichi Fujimoto's innovative work in substrate processing technology and his contributions to the industry through his patents highlight his role as a significant inventor. His dedication to improving device management and operational efficiency continues to influence the field.

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