Company Filing History:
Years Active: 1990-2000
Title: The Innovative Contributions of Keisuke Shinagawa
Introduction
Keisuke Shinagawa, a distinguished inventor based in Kawasaki, Japan, has made significant advancements in the field of semiconductor manufacturing. With a total of 12 patents to his name, Shinagawa's work focuses on improving processes critical to the efficiency and effectiveness of ashing techniques used in semiconductor production.
Latest Patents
Among his latest innovations are two notable patents that showcase his expertise. The first is a "Steam Supplying Apparatus and Method for Controlling Same," which details a steam supplying apparatus designed for providing steam during an ashing process. This apparatus features a closed water-containing vessel crafted from a highly heat-conductive material, ensuring optimal steam generation for use in a vacuum chamber. The design includes specific parameters regarding the vessel’s maximum and minimum horizontal cross-sectional areas, promoting efficiency in operation. Additionally, the apparatus is enhanced with a temperature-controlled liquid bath, contributing to effective steam management.
The second patent is a "Method of Stripping a Resist Mask," aimed at improving the removal of used organic resist from silicon semiconductor wafers. This innovative method incorporates water vapor into an oxygen plasma gas generated by microwaves, which significantly lowers the activation energy needed for the ashing reaction. By increasing the reactivity of the plasma, Shinagawa's method allows for enhanced ashing rates, even at lower processing temperatures, preventing potential contamination and damage to the semiconductor materials.
Career Highlights
Shinagawa has gathered experience from his tenure at esteemed companies such as Fujitsu Corporation and Shinko Seiki Company, Limited. His role in these organizations has solidified his reputation as a leading inventor in the semiconductor sector, where precision and innovation are paramount.
Collaborations
Throughout his career, Shinagawa has collaborated with notable professionals in the industry, including Shuzo Fujimura and Naomichi Abe. These partnerships have undoubtedly contributed to the development of his groundbreaking technologies, showcasing the power of teamwork in advancing innovation.
Conclusion
Keisuke Shinagawa stands out as a pivotal figure in the realm of semiconductor manufacturing, with his patents reflecting a profound understanding of material science and engineering principles. His contributions not only enhance the efficiency of ashing processes but also protect the integrity of semiconductor wafers. As he continues to innovate, the impact of his work will undoubtedly resonate within the industry for years to come.