The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 1995
Filed:
Dec. 27, 1994
Keisuke Shinagawa, Kawasaki, JP;
Shuzo Fujimura, Tokyo, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A process and apparatus for the ashing treatment in which a plasma generated by activating a gas containing at least oxygen is applied to a material to be treated, on which a coating film of an organic is formed, through a plasma-transmitting plate for capturing charged particles in the plasma and allowing the transmission of neutral active species, to thereby ash the coating film of the organic substance. The material to be treated is placed at a position at which charged particles of a high energy, which have been transmitted through the plasma-transmitting plate without being captured by the plasma-transmitting plate, impinge thereon together with the neutral active species which have been transmitted through the plasma-transmitting plate. Also, the ashing treatment process and apparatus includes a distance-adjusting device for adjusting the distance between the plasma-transmitting plate and the material to be treated, by changing the position of the material to be treated.