Hyogo, Japan

Keisuke Joko

USPTO Granted Patents = 3 

 

Average Co-Inventor Count = 5.9

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Amagasaki, JP (2013)
  • Hyogo, JP (2019 - 2020)

Company Filing History:


Years Active: 2013-2020

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3 patents (USPTO):Explore Patents

Title: Keisuke Joko: Innovator in Coating Technologies

Introduction

Keisuke Joko is a notable inventor based in Hyogo, Japan. He has made significant contributions to the field of coating technologies, holding three patents that showcase his innovative approach to surface treatment and composite materials.

Latest Patents

Joko's latest patents include a composition for forming coatings, a production method for surface-treated metal members, and a production method for metal-resin composites. The coating film-forming composition is a solution with a pH range of 4 to 10, which includes an aromatic compound with an amino group and an aromatic ring, a polybasic acid with multiple carboxy groups, and an oxidizing agent. The oxidizing agents used can include hypochlorous acid, chlorous acid, and hydrogen peroxide, among others. This composition is particularly effective for forming a coating film on the surface of metal members. Another patent details a similar composition with a pH range of 6 to 9, which also includes a halide ion, allowing for excellent adhesion to resin surfaces.

Career Highlights

Keisuke Joko is currently employed at Mec Company Ltd., where he continues to develop innovative solutions in coating technologies. His work has significantly advanced the methods used for surface treatment in various applications.

Collaborations

Joko collaborates with talented coworkers, including Yoichi Sengoku and Daisaku Akiyama, who contribute to the innovative environment at Mec Company Ltd.

Conclusion

Keisuke Joko's contributions to coating technologies through his patents reflect his dedication to innovation in the field. His work continues to influence the development of advanced materials and surface treatments.

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