This inventor holds 2 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2020-2022.
Location History:
- Kumamoto, JP (2020)
- Koshi, JP (2022)
Company Filing History:
Years Active: 2020-2022
Title: Keisuke Hamamoto: Innovator in Substrate Inspection Technology
Introduction
Keisuke Hamamoto is a notable inventor based in Koshi, Japan. He has made significant contributions to the field of substrate inspection technology, holding a total of 2 patents. His work focuses on improving the efficiency and accuracy of substrate processing, which is crucial in various manufacturing sectors.
Latest Patents
Hamamoto's latest patents include a substrate inspection method and a substrate inspection apparatus. The substrate inspection method involves a series of processes that include capturing images of the end surfaces of both reference and target substrates while rotating a holding table. This method allows for the calculation of warpage amounts by comparing shape data obtained from the images. The substrate processing apparatus consists of several components, including a carry in/out station, transfer station, processing station, and an image capturing unit. This apparatus is designed to streamline the substrate processing workflow, enhancing productivity and precision.
Career Highlights
Keisuke Hamamoto has established himself as a key figure in the substrate inspection technology sector. His innovative approaches have led to advancements that benefit various industries, particularly in semiconductor manufacturing. His work at Tokyo Electron Limited has positioned him at the forefront of technological development in this field.
Collaborations
Throughout his career, Hamamoto has collaborated with talented individuals such as Yasuaki Noda and Satoshi Morita. These collaborations have fostered an environment of innovation and have contributed to the successful development of his patented technologies.
Conclusion
Keisuke Hamamoto's contributions to substrate inspection technology exemplify the impact of innovation in manufacturing processes. His patents reflect a commitment to enhancing efficiency and accuracy in substrate processing, making him a significant figure in his field.