Ohme, Japan

Keisuke Funatsu


Average Co-Inventor Count = 12.6

ph-index = 6

Forward Citations = 121(Granted Patents)


Location History:

  • Hamura, JP (1995 - 2004)
  • Ohme, JP (1993 - 2005)

Company Filing History:


Years Active: 1993-2005

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15 patents (USPTO):Explore Patents

Title: Keisuke Funatsu: Innovator in Semiconductor Technology

Introduction

Keisuke Funatsu is a prominent inventor based in Ohme, Japan, known for his significant contributions to semiconductor technology. With a total of 15 patents to his name, he has made remarkable advancements in the field of integrated circuit devices.

Latest Patents

His latest patents include a semiconductor integrated circuit device and a process for fabricating the same. This innovative process involves forming MISFETs over the principal surface in active regions of a substrate, surrounded by inactive regions. The method includes several steps, such as forming masks, etching the substrate, and introducing impurities to create channel stopper regions. Additionally, he has developed a method for manufacturing semiconductor devices that involves the formation of insulating films and hard masks, ensuring precise interconnection patterns.

Career Highlights

Throughout his career, Keisuke Funatsu has worked with notable companies, including Hitachi, Ltd. and Hitachi VLSI Engineering Corporation. His experience in these organizations has allowed him to refine his expertise in semiconductor technology and contribute to various innovative projects.

Collaborations

He has collaborated with esteemed colleagues such as Jun Sugiura and Osamu Tsuchiya, further enhancing his work in the semiconductor field.

Conclusion

Keisuke Funatsu's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in integrated circuit devices and manufacturing processes.

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