The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 1995
Filed:
Mar. 07, 1995
Sukeyoshi Tsunekawa, Tokorozawa, JP;
Keisuke Funatsu, Hamura, JP;
Kenichi Kawasumi, Ome, JP;
Akio Inada, Hinode, JP;
Masaro Kaku, Samukawa, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
An apparatus and method for surface treatment of a substance to be processed, which are capable of decreasing the number of foreign matters holding on the reverse side of the substance more than prior art like apparatus and method without largely decreasing a surface treating speed as compared with that of the prior art, by supplying ozone gas to the surface of the substance mounted on a supporting base. The supporting base has a heating part and a supporting part. There is provided a supporting material on the surface of the supporting part for partly supporting one side of the substance to be processed so that a required amount of gap may be formed between the substance to be processed and the supporting part. In the heating part is built a heater. And for a member constituting the supporting part is used a material having greater emissivity than a member constituting the heating part.